DiamNEX - 鑽耐科思

DiamNEX - 鑽耐科思DiamNEX - 鑽耐科思DiamNEX - 鑽耐科思

DiamNEX - 鑽耐科思

DiamNEX - 鑽耐科思DiamNEX - 鑽耐科思DiamNEX - 鑽耐科思
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Large-size, Ultra-flat, Polycrystalline Diamond Films

Large-size, Ultra-flat, Polycrystalline Diamond FilmsLarge-size, Ultra-flat, Polycrystalline Diamond FilmsLarge-size, Ultra-flat, Polycrystalline Diamond Films

大尺寸、超平整、多晶金剛石薄膜

Company Profile

Focusing on the development, production and 

commercialization of next-generation diamond 

thin film materials. 


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Technology Breakthrough

 We employ global-first technology  "Edge-Exposed Exfoliation", which revolutionizes material processing by bypassing traditional steps such as cutting, etching, and polishing. 

Product Features

The transferable, bendable nature is perfectly compatible with existing semiconductor processes.  

Application

The optical, electrical and thermal properties are close to those of monocrystalline diamond, and have a variety of potential applications.

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